GEMSTAR™ Meeting the challenge of high aspect ratio deposition over a broad range of substrates in a small package

Economical systems engineered for heavyweight tasks and lightweight budgets

“GEMSTAR-6 has everything our lab environment should need in an ALD tool. It is small, flexible and can handle up to six inch wafers. We also like the 1” height of the chamber that accommodates small, three dimensional objects and the port we can use for in-situ metrology. The design appears to be rugged and easy to service.”

John F. Conley, Jr. ,PhD and Professor at Oregon State University for further information please click

“Much of our research is based around arrays of vertical nanostructures. The GEMSTAR ALD system allows us to deposit very uniform metallic and oxide thin films over these structures”

Steve Shepard, Nanofabrication Facility Manager, Boston College for further information please click

Photek presents poster on "Extended lifetime MCP-PMTs: Characterisation and Lifetime measurements of ALD coated Microchannel Plates, in a sealed photomultiplier tube" at the 13th Vienna Conference on Instrumentation

Using GEMSTAR and the patented Atomic Layer Deposition (ALD) Micro Channel Plate (Amplifier) process

Photek: Extended lifetime MCP-PMT, for further information please click

The product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They are designed for uniform conformal growth of films from precursors that have a CVD growth component.

The uniformity of thin films can determine whether a process or device works, the systems are designed to provide the user with the most uniform films possible, even in challenging HAR through-hole applications.

Contact Marketing@Arradiance.com for more information on GEMSTAR™ systems

ARR-40900 GEMSTAR-6 Benchtop ALD System

The 150mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It is designed for uniform conformal growth of films from precursors that have a CVD growth component.

ARR-840900 GEMSTAR-8 Benchtop ALD System

The 200mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It is designed for uniform conformal growth of films from precursors that have a CVD growth component.

ARR-940900 GEMSTAR-A Benchtop Controlled Gas Environment Anneal System

The 200mm square system anneals substrates in a vacuum controlled user selectable gas environment.