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GEMStar™ Benchtop Atomic Layer Deposition Process Systems

Meeting the challenge of high aspect ratio deposition over a broad range of substrates in a small package. Economical systems engineered for heavyweight tasks and lightweight budgets



The product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They are designed for uniform conformal growth of films from precursors that have a CVD growth component.


The uniformity of thin films can determine whether a process or device works, the systems are designed to provide the user with the most uniform films possible, even in challenging HAR through-hole applications.

GEMStarTM Benchtop ALD Process Systems

Contact Marketing@Arradiance.com for more information on GEMSTAR™ systems


ARR-40900 GEMStar-6 Benchtop ALD System

The 150mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It is designed for uniform conformal growth of films from precursors that have a CVD growth component.


ARR-840900 GEMStar-8 Benchtop ALD System

The 200mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It is designed for uniform conformal growth of films from precursors that have a CVD growth component.


ARR-940900 GEMStar-A Benchtop Controlled Gas Environment Anneal System

The 200mm square system anneals substrates in a vacuum controlled user selectable gas environment.

Customer Quotations

“The Arradiance GEMStar-6 reactor has been in use in my laboratory for eight months continuously now and has performed consistently. It has worked from day one, and we have had no downtime at all so far, not even pump oil changes (with the exhaust abatement system). The chamber temperature is well controlled and the films are homogeneous.”

Prof. Julien Bachmann PhD, Inorganic and General Chemistry, University of Erlangen-Nürnberg


“The GEMStar-8 ALD system is critical to our nanomaterials for clean energy research. In particular, the particle holder has been working perfectly for ALD coatings on nanostructured materials for Li batteries and fuel cells …… even better than expected.”

Prof. Andy Sun PhD, Mechanical and Materials Engineering, University of Western Ontario


“We are loving the tool here [GEMStar-8], using quite a lot and it is giving great results!.”

Mark R. April, Equipment Engineer, Draper Laboratory


“GEMStar-6 has everything our lab environment should need in an ALD tool. It is small, flexible and can handle up to six inch wafers. We also like the 1” height of the chamber that accommodates small, three dimensional objects and the port we can use for in-situ metrology. The design appears to be rugged and easy to service.”

John F. Conley, Jr. ,PhD and Professor at Oregon State University for further information please click


“Much of our research is based around arrays of vertical nanostructures. The GEMStar ALD system allows us to deposit very uniform metallic and oxide thin films over these structures”

Steve Shepard, Nanofabrication Facility Manager, Boston College for further information please click


“We study the properties of biomolecules using various nanoscale systems. This requires the fabrication of uniform ultrathin freestanding membranes, some of which are deposited using our GEMStar ALD system. This system is small, easy to use, low-maintenance, and has been a workhorse for us – it just runs!

Prof. Meni Wanunu, Departments of Physics and Chemistry/Chemical Biology

The Wanunu Lab, Nanoscale Biophysics, Northeastern University for further information please click


Photek presents poster on "Extended lifetime MCP-PMTs: Characterization and Lifetime measurements of ALD coated Microchannel Plates, in a sealed photomultiplier tube" at the 13th Vienna Conference on Instrumentation

Using GEMStar and the patented Atomic Layer Deposition (ALD) Micro Channel Plate (Amplifier) process

Photek: Extended lifetime MCP-PMT, for further information please click