The GEMStar XT platform is the next generation of the popular GEMStar line of full-feature, benchtop Atomic Layer Deposition Systems
A small, rugged, lightweight machine for heavyweight R&D efforts, GEMStar XT makes optimal use of lab space and research budgets.
The GEMStar XT Thermal Atomic Layer
Deposition system offers 300 °C (500 °C optional)
ALD processing through the full range of substrates,
including Solar Cell ALD development.
Configured standard with
single or dual 200 °C manifold
zones, and four or eight high speed material ALD valve ports (one
with vapor push technology), two locatable 200 °C
material temperature zones and an external gas
interface, the GEMStar XT represents one of the
most configurable systems in its price range.
Pulsed Vapor Push technology controlled by an additional high speed c-seal ALD valve offering a solution for low vapor pressure materials.
for more information on GEMStar XT Thermal Systems