The GEMStar XT platform is the industry’s only true benchtop Atomic Layer Deposition (ALD) System, now more configurable to meet our Customer’s needs and budgets
GEMStar XT family produces best in class ALD films from high aspect ratio particles through 200mm substrates both in single substrate and batch modes of operation.
The GEMStar XT-P Plasma Enhanced Atomic Layer Deposition (PEALD) system extends the capabilities of the GEMStar XTTM Thermal system to include best in class plasma processing through the full range of substrates.
Configured with a 300 Watt air cooled direct Inductively
Coupled Plasma (ICP) RF system with four mass flow controlled gas
inputs, single or dual 200°C manifold zones, four or eight high speed material ALD
valve ports (one with vapor push technology), two locatable 200°C
material temperature zones and an external gas interface, the
GEMStar XT-DP system is a powerful plasma enabled tool to extend your research and processing requirements to the next level.
Marketing@Arradiance.com for more information on GEMStar XT-P Systems