GEMSTAR™ Meeting the challenge of high aspect ratio deposition over a broad range of substrates in a small package

Economical systems engineered for heavyweight tasks and lightweight budgets

The product line deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. They are designed for uniform conformal growth of films from precursors that have a CVD growth component.

The uniformity of thin films can determine whether a process or device works, the systems are designed to provide the user with the most uniform films possible, even in challenging HAR through-hole applications.

If you are doing ALD research at 450mm, ask about our 8 precursor 450mm GEMSTAR-18™ system

Contact Marketing@Arradiance.com for more information on GEMSTAR-18™ systems

ARR-40900 GEMSTAR-6 Benchtop ALD System

The 150mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It is designed for uniform conformal growth of films from precursors that have a CVD growth component.

ARR-840900 GEMSTAR-8 Benchtop ALD System

The 200mm Ø system deposits low temperature conformal metal, semiconductor and insulating films on planar and high aspect ratio (HAR) structures. It is designed for uniform conformal growth of films from precursors that have a CVD growth component.

ARR-940900 GEMSTAR-A Benchtop Controlled Gas Environment Anneal System

The 200mm square system anneals substrates in a vacuum controlled user selectable gas environment.