Welcome to Arradiance
Specializing in Atomic Layer Deposition
We provide ALD and MLD deposition solutions
Our technology is used by the world’s leading material researchers
Develop your applications using our deposition systems
Let us assist at our on-site rapid turn foundry
Molecular Innovation™
Our technology is used worldwide creating new technology in
- Clean-E
- E-Storage
- Sensors
- µElectronics
- ղTechnology
- Optoelectronics
- Catalysis
Applications
Recent News at Arradiance
Improved refractive index of 3D photonic crystals using ALD
Scientists from the UIC and ANL improved the poor refractive index of 3D photonic crystals by sequential infiltration of ZnO in Arradiance GEMStar ALD system
Enhanced field emission of CNT forests using ALD
Researchers at Hamburg University have used an Arradiance GEMStar XT-P system to deposit electrically conductive titanium nitride as a diffusion barrier for carbon nanotube growth. This allows carbon nanotube forests to be used in vacuum nanoelectonics with much lower voltages, increasing the viability of these promising devices
ALD process for depositing pure copper (II) oxide
Scientists from Humboldt University of Berlin in Germany developed a novel ALD process for depositing pure copper (II) oxide (CuO), a p-type semiconductor for low power CMOS circuits, sensor and energy conversion applications, using Arradiance GEMStar ALD
MLD improves lithium-ion battery capacity loss
Scientists from the Swiss Federal Laboratories for Materials Science and Technology (EMPA) employed molecular layer deposition (MLD) with lithium tert-butoxide to grow lithicone layers in Arradiance GEMStar XT-P directly onto porous nickel-rich Li-Ni-Mn-Co particle electrodes for high-energy-density lithium-ion batteries, mitigating the first-cycle capacity loss
Next-generation superconducting radio frequency (SRF) cavities using ALD
Arradiance GEMStar XT-P tool helps to grow NbTiN thin films of superconductor–insulator–superconductor (SIS) multilayers for the next-generation superconducting radio frequency (SRF) cavities for more efficient and sustainable state-of-the-art particle accelerators
ALD intermetallics improves catalytic dehydrogenation of ethane
Scientists from the University of Alabama and Argonne National Laboratory report new progress in creating Pt-Zn intermetallic nano catalyst for dehydrogenation of ethane, using Arradiance GEMStar ALD deposition system
Arradiance unleaded glass technology
Resistive glass components for gas chromatography, mass spectrometry, electro-optics, high energy physics, and in medical and defense applications contain reduced lead oxide. We have the solution to eliminate the need for lead in your glass components required by the RoHS Directive 2011/65/EU
Determination of surface area using ALD
Surface area of a material is key determining its performance for catalysts, battery and capacitor electrodes, concrete components, and water filters. Researchers at Northwestern University developed a way to measure surface area using GEMStar™
Arradiance MCP technology delivers an equivalent of 70 years life
High-surface area MCP-PMTs demonstrated a lifetime equivalent of > 70 years of detector operation for proton-antiproton annihilation (PANDA) using Arradiance patented technology
Long-life silicon anodes for lithium-ion batteries using MLD
Green energy imposes increasing demands on lithium battery capacities, rates, and cycling lifespan. As a result, the electrochemical performance and cost of the battery anode become critical
MIT adds GEMStar XT-P to create and analyze at the nanoscale
The Arradiance GEMStar XT-P plasma-enhanced atomic layer deposition (ALD) system was installed at MIT.nano in May
Ecoresorbable and bioresorbable MEMS using ALD
The 20 nm SiO2 encapsulation layer in this research was deposited using a GEMStar XT-P, a plasma enabled atomic layer deposition system
Desalination of water using ALD + MLD
Researchers at Blaustein Institute for Desert Research present a solution to improve membrane selectivity creating ion selective nanofiltration (NF) with ALD + MLD using a GEMStar XT system
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Your Partner
Your molecular scale partner
When you require control at the molecular scale
Arradiance atomic layer deposition solutions support Research and Development around the world
We’ve been at the leading edge of Atomic Layer Deposition (ALD) and Plasma Enhanced Deposition (PEALD) technology for two decades
Purdue University
Dr. Chen Yang
“Purdue University was one of the earliest adopters of the Arradiance® GEMStar XT-P Plasma PEALD system, which we received in June 2015. Our overall experience with the GEMStar XT-P Plasma system, service and support from Arradiance® has been excellent. We primarily use the system to this point for oxides and metal depositions. The Purdue team was even successful depositing a very challenging Plasma Al film. We would highly recommend that you contact Arradiance® for your ALD or PEALD system and coating needs”
Friedrich-Alexander-Universität
Prof. Julien Bachmann PhD
“The Arradiance GEMStar-6 reactor has been in use in my laboratory for eight months continuously now and has performed consistently. It has worked from day one, and we have had no downtime at all so far, not even pump oil changes (with the exhaust abatement system). The chamber temperature is well controlled and the films are homogeneous.”
University of Tokyo
Prof. Satoshi Uchida
“The Arradiance GEMStar-XT reactor in my laboratory is consistently producing high quality hole-blocking layer TiO2 film in my perovskite solar cell research. The ALD-based TiO2 layer through GEMStar-XT enables a high power conversion efficiency of 20% repeatedly and I am very pleased with the performance of GEMStar ALD tool”
Texas State University
Dr. Casey Smith
“The Texas State University Nanofabrication Research Service Center is extremely pleased with the versatility of our GEMStar XT-DP PEALD System
The equipment is compact, economical, easily installed, well documented, and utilizes an intuitive user interface. Arradiance technical staff have rapidly responded to my requests for recipes and new chemistry support. To date we have trained more than 25 users in our shared cleanroom facility who have successfully deposited TiO2, Al2O3, ZnO, Al:ZnO, ZrO2, and/or SnO2”